Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.[1]
Plasma processing techniques include:
- Plasma activation
- Plasma ashing
- Plasma cleaning
- Plasma electrolytic oxidation
- Plasma etching
- Plasma functionalization
- Plasma polymerization
- Corona treatment
- Plasma modification
Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.
References
- ↑ National Research Council (1991). Plasma Processing of Materials: Scientific Opportunities and Technological Challenges. Washington, DC: National Academies Press. doi:10.17226/1875. ISBN 978-0-309-04597-1.
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